Sample Product page DS10

Photoresist is a light sensitive material that is used extensively in the PCB manufacturing process. The process starts by coating a substrate with a light-sensitive organic material and subsequently a patterned mask is applied to the surface to block light, only allowing the unmasked regions to be exposed. Our unique Developer DS10 is then applied to the surface to dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed.

Our highly concentrated developer solution results in an increased light sensitivity of positive resist developer systems. The required exposure energy is minimized and development time is reduced to allow for higher operational capacity. Furthermore, this makes the feed-and-bleed control of the developer solution simple and consistent.

Our Developer DS10 has only shown to reduce scum formation and prevent scaling allowing for significant decrease in downtime and machine wear. Additionally, the filtered liquid concentrate eliminates existing carbon particles in the process resulting in increased yield and optimum output during the manufacturing process.

Finally, our DS10 has no EDTA in its composition allowing for easy and cost-efficient waste treatment.

High Concentration: Reduced Exposure Energy and Development Time

Smaller Volume Required:  Lower Handling and Freight Costs

No Scaling and Reduced Scum Formation: Significantly Lower Downtime and Machine Wear

No EDTA:  Easy and Cost-Efficient Waste Treatmentmooth Filtration for Increased Bath Life

Filtered Concentrate: Removal of Carbon Particles During Manufacturing Process